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MML8-80D-IR   >   제품소개   >   렌즈   >   MML8-80D-IR

MML8-80D-IR
  • MML8-80D-IR

MML8-80D-IR

  • Maker

    MORITEX
  • Model name

    MML8-80D-IR
  • Magnification

    8
  • WD(mm)

    81
  • Max. Image Format

    2/3"
  • Depth of Field(mm)

    0.027
  • Fno

    26.9
  • Distortion(%)

    -0.014
  • Mount

    C

상세내용

  • Dedicated near-infrared design (770 nm to 1200 nm)
  • Telecentric optical system with very little image distortion
  • High magnification models
  • Uniform coaxial illumination functionality covering the entire field of view

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Main Applications

  • Non-visible imaging
  • Wafer void and MEMS inspections
  • SAW filter (LiNb03 LiTa03) inspections
  • Wafer on wafer alignment
  • FCB positioning
  • Image recognition through film
  • Wiring recognition on TAB circuit boards
  • Wafer surface observation/ OCR

Specifications

SpecMML8-80D-IR
Coaxial Illumination
Magnification8
WD (mm)81
Resolution (μm)4
Depth of Field (mm)0.027
NA0.15
Effective Fno26.9
Distortion (%)-0.014
Weight (g)110
Largest Compatible Sensor2/3" type
MountC mount

* Depth of field is calculated assuming a horizontal 435TV resolution using a 2/3" CCD camera. (Permissible circle of confusion on the image-formation side: 30μ)
* Resolution values indicate the theoretical resolution at a wavelength of 985nm.


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